2013-01-31
Electron Beam Lithography Workshop, στον Δημόκριτο, 15/2/2013
Dear colleague,
You are invited to participate in the Electron Beam Lithography Workshop that will be held in the Institute of Advanced Materials, Physicochemical Processes, Nanotechnology and Microsystems of NCSR “Demokritos” on Friday 15 February 2013 from 9:30 to 14:00.
Electron Beam Lithography (EBL) systems are based on the electron microscope and they enable the fabrication of extremely fine patterns with great accuracy. It is the technology of choice for the fabrication of nanostructures, the fabrication of masks used in the IC industry and the design of prototypes for nanoelectronic devices, integrated optics, photonics and functional nanostructures. The purpose of this workshop is:
-- to present the newly purchased state-of-the-art 100keV Electron Beam Lithography system (EBPG5000+ES) from Vistec Lithography
-- to discuss with the Greek scientific community the possibilities of its exploitation and the involvement in research projects and
-- to lay down the collaboration terms and the rules for its usage.
The program of the workshop includes the presentation of the system and the lab facilities, lectures by experts in e-beam lithography and a round table discussion. You will receive a detailed program as soon as possible. What we need from you at the moment is to respond if you are willing to participate by completing the attached form and mailing it back to us.
Sincerely,
N.Glezos, Director of Research
Institute of Advanced Materials, Physicochemical Processes, Nanotechnology and Microsystems
Division of Microelectronics, NCSR "Demokritos"
Patriarchou Gregoriou and Neapoleos, 15310, Agia Paraskevi, Attiki, Greece
tel: +30 210 6503236, fax: +30 210 6511723, http://imel.demokritos.gr
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